Type |
Substrates |
Display |
Desciption |
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Si Epi |
Si |
|
size |
3-8” |
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Type |
P/P++, N/N++, N/N+, N/N+/N++, N/P/P, P/N/N+ |
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Epi Resistivity (Ω*cm) |
0.001-1500 |
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Homogeneity |
<6% |
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Epi Thickness ( µm) |
0.1-200 |
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Homogeneity |
<10% |
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R-Sapphire (SOS) |
|
size |
EPI Thickness (um) |
EPI Res.(ohm.cm) |
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150 mm (6”) |
0.3 |
>30 |
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100 mm (4”) |
0.3,0.6 |
>30 |
5-30 |
2.5-10 |
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76 mm (3”) |
0.6-5 |
0.003-0.025 |
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|
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GaN/SiC Epi |
C-Sapphire |
|
EPI Type |
N型(掺Si)、P型(掺Mg)、不掺杂 |
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Standard size |
2” |
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Sapphire Thickness (um) |
430 |
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EPI Thickness (um) |
3-9um |
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Si/SiC |
4-6” GaN Epi on Si /SiC 4-6” SiC Epi on SiC |
|
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LED/LD Epi |
GaAs |
|
2", 2 um AlInP EPI layer on GaAs substrate |
典型波长: 792nm、808nm、825nm、880nm、915nm、940nm、976nm、980nm、1060nm、1550nm。可制作2W和4W器件。 可以提供LED级别的,2寸红光,蓝光,绿光外延片。我们拥有MBE工艺,按客户要求定制苛刻要求的各种GaAs基,InP基,Si基等复杂结构的外延。 可提供PL、X-ray、ECV检测报告。 |
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2" AlGaAs on GaAs(N-type i-doped) substrate |
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3" structure is from bottom to top |
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InP |
|
2" /InP/ undoped |
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2", 2 um InGaAs EPI layer on InP substrate |
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InP / 1.8 micron / undoped In(0.53)Ga(0.47)As/300 nm / p-type 1e18 cm-3 InP substrate / 350 micron / undoped |