北京特博独家代理美国高端IBE离子束刻蚀系统--功能强大--高性价比--科研用户首选。
北京特博独家代理美国高端IBE离子束刻蚀系统--功能强大--高性价比--科研用户首选。
主要用途 |
1. Ion Beam Etching to fabricate micro-nanometer features in any material (metals, insulators, organics, composites, multilayers). 2. Ion Beam Surface Modification to create nanostructures, textures and smoothness. 3. Physical Vapor Deposition to build thin films and stacks by evaporation, sputtering and reactive growth. 4. Ion Beam Sputter Deposition confronts the need for upper tier thin film results, when achieving the highest quality properties and precision control is justified. |
优势 |
Multifunctional Process Tool combines etching and deposition in one vacuum process chamber. |
系统构成 刻蚀图例 |
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应用领域 |
1. Semiconductor 2. Nanotechnology 3. Photonics 4. Spintronics |
适应的刻蚀材料 |
1. Noble Metals ; 2. Insulators 3. Diamond Films 4. Optical Wave Guides 5. Superconducting Materials 6. Magnetic Materials |
工艺能力 |
1. Ion Beam Etching (IBE) 2. Reactive Ion Beam Etching (RIBE) |